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Title: | Thermally activated processes: the underlying mechanism of activated state formation |
Authors: | Lazarenko, M. M. Zabashta, Y. F. Alekseev, O. M. Alekseev, S. A. Yablochkova, K.. S. Vergun, L. Y. Bulavin, L. A. |
Issue Date: | 2024 |
Publisher: | ROYAL SOC CHEMISTRY |
Abstract: | In the present manuscript, we highlight the contradictions in the thermally activated processes theory which treats a system's activated state as a state of the phonon subsystem. We offer an alternative model, in which the activated state is treated as an electron subsystem state. The mechanism of the activated state formation is as follows: thermal fluctuations excite electrons of some particles within the activation zone. This excitation is then shared with other particles in the ground state. This creates a locallyequilibrium activated state. We estimate the lifetime of such a state and derive expressions for the activation energy and entropy, necessary to calculate the number of excited particles in the activation zone and the energy of the particle's excitation. We validate the model experimentally, by examining the behavior of nanocrystals of undecylenic acid in pores of silica gels using dielectric spectroscopy and the analysis of the complex dielectric permittivity behavior at different temperatures and with different frequencies of the external field. The estimated number of excited particles in the activation zone of the nanocrystals and the particle excitation energy for the dielectric relaxation process observed in undecylenic acid confirm that the results of the experiment align well with the proposed model. |
Description: | Lazarenko, M. M., Zabashta, Y. F., Alekseev, O. M., Alekseev, S. A., Yablochkova, K. S., Vergun, L. Y., & Bulavin, L. A. (2024). Thermally activated processes: the underlying mechanism of activated state formation. RSC advances, 14(53), 39242-39252. DOI: 10.1039/d4ra06983h |
URI: | https://www.webofscience.com/wos/woscc/full-record/WOS:001374252100001 https://pubs.rsc.org/en/content/articlelanding/2024/ra/d4ra06983h https://dspace.chmnu.edu.ua/jspui/handle/123456789/2620 |
ISSN: | 2046-2069 el. |
Appears in Collections: | Публікації науково-педагогічних працівників ЧНУ імені Петра Могили у БД Web of Science |
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Thermally activated processes_the underlying.pdf | 715.63 kB | Adobe PDF | View/Open |
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