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Titel: Thermally activated processes: the underlying mechanism of activated state formation
Autoren: Lazarenko, M. M.
Zabashta, Y. F.
Alekseev, O. M.
Alekseev, S. A.
Yablochkova, K.. S.
Vergun, L. Y.
Bulavin, L. A.
Erscheinungsdatum: 2024
Herausgeber: ROYAL SOC CHEMISTRY
Zusammenfassung: In the present manuscript, we highlight the contradictions in the thermally activated processes theory which treats a system's activated state as a state of the phonon subsystem. We offer an alternative model, in which the activated state is treated as an electron subsystem state. The mechanism of the activated state formation is as follows: thermal fluctuations excite electrons of some particles within the activation zone. This excitation is then shared with other particles in the ground state. This creates a locallyequilibrium activated state. We estimate the lifetime of such a state and derive expressions for the activation energy and entropy, necessary to calculate the number of excited particles in the activation zone and the energy of the particle's excitation. We validate the model experimentally, by examining the behavior of nanocrystals of undecylenic acid in pores of silica gels using dielectric spectroscopy and the analysis of the complex dielectric permittivity behavior at different temperatures and with different frequencies of the external field. The estimated number of excited particles in the activation zone of the nanocrystals and the particle excitation energy for the dielectric relaxation process observed in undecylenic acid confirm that the results of the experiment align well with the proposed model.
Beschreibung: Lazarenko, M. M., Zabashta, Y. F., Alekseev, O. M., Alekseev, S. A., Yablochkova, K. S., Vergun, L. Y., & Bulavin, L. A. (2024). Thermally activated processes: the underlying mechanism of activated state formation. RSC advances, 14(53), 39242-39252. DOI: 10.1039/d4ra06983h
URI: https://www.webofscience.com/wos/woscc/full-record/WOS:001374252100001
https://pubs.rsc.org/en/content/articlelanding/2024/ra/d4ra06983h
https://dspace.chmnu.edu.ua/jspui/handle/123456789/2620
ISSN: 2046-2069 el.
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